RESISTANCE ELEMENT AND SEMICONDUCTOR DEVICE USING THE SAME AND MANUFACTURE THERE OF

摘要

PROBLEM TO BE SOLVED: To provide a resistance element in which a stable resistance value can be obtained even if a little mask scale slippage is developed, and a semiconductor device using this, and a method for manufacturing them. SOLUTION: This resistance element is formed of a wiring layer consisting of a high resistance part 21 having a bending part having a bending angleθprovided in an area including this bending part, and low resistance parts 22a and 22b. A boundary 23 between the low resistance parts 22a 22b and the high resistance part 21 is set almost parallel with a bisector 25 of the bending angleθ.