| 摘要 |
<p>A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises: (A) an acid generator containing (a) a sulfonium salt represented by the following formula (I): <CHEM> wherein Q<1> and Q<2> is alkyl or a cycloalkyl, or Q<1> and Q<2> form, together with a sulfur atom to which Q<1> and Q<2> are adjacent, an heteroalicyclic group; Q<3> represents a hydrogen atom, Q<4> represents alkyl or a cycloalkyl, or Q<3> and Q4 form, together with a CHC(O) group to which Q<3> and Q4 are adjacent, a 2-oxocycloalkyl group; and Q<5>SO3<-> represents an organosulfonate ion, and (b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb): <CHEM> wherein P<1> to P<5> represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P<6>SO3<-> and P<7>SO3<-> each independently represent an organosulfonate ion; and (B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.</p> |
