PLASMA FILM-FORMING APPARATUS AND PROCESS FOR FORMING CARBON FILM

摘要

PROBLEM TO BE SOLVED: To provide a plasma film-forming apparatus having a simple structure which enables the formation of a uniform carbon film with a large area, and a process for forming a carbon film. SOLUTION: The plasma film-forming apparatus 1 is equipped with at least a reaction chamber 2 into which a reactive gas is introduced, an anode 3 positioned inside the reaction chamber 2 and a rod-shaped cathode 4. The apparatus forms a carbon film on a substrate 8 placed above the anode 3 by allowing the reactive gas to react with plasma generated through electric discharge between the cathode 4 and the anode 3. The cathode 4 consists of multiple discharge parts 4b, 4c and 4d having different thermoelectronic emission characteristics which are arranged in the decreasing order of their thermoelectronic emission characteristics toward the anode 3.