| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative resist composition which simultaneously satisfies such properties as high sensitivity, high resolution, a good pattern shape and good line edge roughness. <P>SOLUTION: The negative resist composition comprises: (A) an alkali-soluble polymer; (B) a crosslinking agent which crosslinks with the alkali-soluble polymer (A) under the action of an acid; (C) an acid generator which generates a sulfonic acid represented by the formula Ra-SO<SB>3</SB>H (where Ra is a 4-30C alkyl, a 4-30C alkenyl or a 4-30C alkynyl) upon irradiation with an actinic ray or a radiation; and (D) an acid generator which generates a sulfonic acid other than the sulfonic acids represented by the above formula upon irradiation with an actinic ray or a radiation. <P>COPYRIGHT: (C)2003,JPO |
