发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING, METHOD FOR FORMING CURED FILM USING THE SAME, CURED FILM AND SEMICONDUCTOR DEVICE
摘要 <p>Disclosed is a positive photosensitive resin composition for spray coating, which is used for forming a coating film by spray coating the positive photosensitive resin composition over a substrate such as a semiconductor device mounting substrate, a ceramic substrate or an aluminum substrate. This positive photosensitive resin composition for spray coating is characterized by containing an alkali-soluble resin (A), a compound (B) generating an acid by the action of light and a solvent (C), and having a viscosity of 2-200 cP.</p>
申请公布号 WO2009014113(A1) 申请公布日期 2009.01.29
申请号 WO2008JP63120 申请日期 2008.07.22
申请人 SUMITOMO BAKELITE COMPANY LIMITED;BANBA, TOSHIO;ORIHARA, HIDEKI 发明人 BANBA, TOSHIO;ORIHARA, HIDEKI
分类号 G03F7/023;G03F7/004;G03F7/16;H01L21/027 主分类号 G03F7/023
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