发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING, METHOD FOR FORMING CURED FILM USING THE SAME, CURED FILM AND SEMICONDUCTOR DEVICE |
摘要 |
<p>Disclosed is a positive photosensitive resin composition for spray coating, which is used for forming a coating film by spray coating the positive photosensitive resin composition over a substrate such as a semiconductor device mounting substrate, a ceramic substrate or an aluminum substrate. This positive photosensitive resin composition for spray coating is characterized by containing an alkali-soluble resin (A), a compound (B) generating an acid by the action of light and a solvent (C), and having a viscosity of 2-200 cP.</p> |
申请公布号 |
WO2009014113(A1) |
申请公布日期 |
2009.01.29 |
申请号 |
WO2008JP63120 |
申请日期 |
2008.07.22 |
申请人 |
SUMITOMO BAKELITE COMPANY LIMITED;BANBA, TOSHIO;ORIHARA, HIDEKI |
发明人 |
BANBA, TOSHIO;ORIHARA, HIDEKI |
分类号 |
G03F7/023;G03F7/004;G03F7/16;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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