发明名称 High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
摘要 A spectrometer based on a high-resolution confocal Fabry-Perot interferometer for detection of wavelength, FWHM and/or 95% bandwidth of a laser beam of a narrow band tunable excimer or molecular fluorine lithography laser, or EUV generating source, preferably includes a reduction telescope for reducing the laser beam, a diffusor to homogenize the incident excimer or molecular fluorine lithography laser beam, a housing for mounting the confocal Fabry-Perot interferometer between windows in a sealed and temperature-stabilized housing, imaging optics for bringing the incident beam to focus at approximately a center of the interferometer, interferometer fringe imaging optics, and a photoelectric detector of the interferometer fringe image.
申请公布号 US2003161374(A1) 申请公布日期 2003.08.28
申请号 US20020293906 申请日期 2002.11.12
申请人 LAMBDA PHYSIK AG 发明人 LOKAI PETER
分类号 G03F7/20;H01S3/00;(IPC1-7):H01S3/22;H01S3/223 主分类号 G03F7/20
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