| 摘要 |
PURPOSE:To prevent damage due to the generation of heat of a microwave transmitting window, and to treat a sample stably by mounting the transmitting window where the amplitude of an electric field by a standing wave is minimized. CONSTITUTION:A sample 27 is placed on a sample stage 28, a sample treating chamber 21 is evacuated from an exhaust port 22, a microwave oscillator 31 is operated, microwaves are worked to a treating gas in a plasma generating chamber 24 through a wave guide and a transmitting window 30 to generate plasma, a plasma etching gas mainly comprising radicals is introduced into the sample treating chamber 21 from plasma ejecting holes 26, and the sample 27 is etched and treated. Since the microwave transmitting window 30 is mounted where the amplitude of an electric field by standing waves generated in the plasma generating chamber 24 is minimized at that time, the etching rate of the microwave transmitting window 30 consisting of a quartz board is reduced, the life of a device can be lengthened, trouble such as the seizure of an O ring 32 due to a temperature rise in the microwave transmitting window consisting of an alumina material is prevented, and the sample 27 can be treated stably by plasma. |
