发明名称 |
ORGANIC EL DEVICE MANUFACTURING APPARATUS, ORGANIC EL DEVICE, AND ELECTRONIC APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an organic EL device manufacturing apparatus having a plasma treatment device for reducing the flow of gas in use and increasing a processing efficiency and reducing a processing cost by continuously performing a plasma treatment. <P>SOLUTION: The plasma treatment device S comprises a sample stage 12 for supporting a sample 43, a plasma discharge electrode 20 installed at a position opposed to the sample 43 supported on the sample stage 12, a gas jetting port 29 for supplying mixed gas into a discharge gap 47 between the plasma discharge electrode 20 and the sample 43, and a moving device 12A for moving the sample stage 12 relative to the plasma discharge electrode 20. The mixed gas from the gas jetting port 29 is set to flow in one rear direction relative to the moving direction of the sample 43. <P>COPYRIGHT: (C)2003,JPO |
申请公布号 |
JP2003257647(A) |
申请公布日期 |
2003.09.12 |
申请号 |
JP20020059563 |
申请日期 |
2002.03.05 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SEKI SHUNICHI;MIYAJIMA HIROO |
分类号 |
H05H1/46;H01L51/50;H05B33/10;H05B33/14;H05B33/26 |
主分类号 |
H05H1/46 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|