APPARATUS FOR PLASMA JET TREATMENT OF SUBSTRATES

摘要

An apparatus for processing large substrates with a plasma jet with increased throughput is described. The apparatus comprises one or more carousels for holding a plurality of substrates. The carousels further comprise a rotatable angle drive having a rotation axis Da, a plurality of arms extending radially from the angle drive and a plurality of rotatable substrate holders, each of the substrate holders being connected to one of the arms, each of the rotatable substrate holders having a rotation axis Ha positioned at a distance R from the rotation axis Da of the rotatable angle drive. The carousel angle drive provides programmable motion of the substrates being treated relative to the plasma jet. The apparatus includes a plasma jet generator with a means to adjust the plasma jet cross section shape. This allows uniform treatment of large substrates by a programmed carousel velocity function that is within an easily executed motion range. The apparatus also includes a plasma jet generator for providing a plasma jet and a means for moving the plasma jet generator from a first position Z1 adjacent to the first carousel to a second position Z2 adjacent to the second carousel. While the substrates on the first carousel are being treated by the plasma jet, the substrates on the second carousel can be loaded or unloaded. Once the treatment of the substrates on the first carousel is completed, the plasma jet is moved from the first position Z1 to the second position Z2.