| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inductively coupled plasma processor in which by- products can be prevented from adhering to a quartz window or by-products adhered to the quartz window can easily be removed. <P>SOLUTION: In the inductively coupled plasma processor for processing an article by plasma generated by the inductive coupling of electromagnetic waves through a dielectric window, the surface of the dielectric window is covered with a conductor and surrounded by the conductor, a part of the conductor is cut to expose its surface, and the inductive coupling of electromagnetic waves takes place through the exposed dielectric window. <P>COPYRIGHT: (C)2003,JPO |
