| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system for designing a matching circuit of a plasma treatment apparatus, by which a maker of matching circuits procures impedance Z0, Z1 through a communicating means to produce a matching circuit corresponding to a plasma discharged state, thereby lessening power loss on the matching circuit. <P>SOLUTION: The system for designing a matching circuit of a plasma treatment apparatus comprises a matching circuit 2A for adjusting output impedance by a tuning capacitor 255 and a load capacitor 256, a adjusted quantity measuring unit 52 for outputting adjusted quantity data D2, D1 indicating these adjusted quantities, a reflected wave measuring unit 50 for measuring a reflected wave of power from a high-frequency power source 1 upon plasma discharge, a drive control unit 51 for controlling a variable passive element in such a manner that the reflected wave is made a minimum state, an operating unit 71 for operating impedance Z1 of a plasma treatment chamber CN from the adjusted quantity data at this time and a design unit 72 for operating a circuit constant on the basis of the impedance Z1 to design a matching circuit 2B, and the respective units are connected to one another through an information communication network I. <P>COPYRIGHT: (C)2003,JPO |
