发明名称 Zircon refractory contg. uniform dispersion of unstabilised zirconia
摘要 Compsn. contains at least 50 wt.% ZrSiO4 and at least 1 wt.% ZrO2 particles uniformly dispersed throughout compsn.: ZrSiO4 is pref. aggregated zircon particles with particle size of less than 10 microns. Compsn.is pref. up to 25% ZrO2 and 75% zircon, or is 90% or more zircon and 10% ZrO2 or less. Grain growth aid for zircon, pref. up to 2 wt.% titania, is pref. included. Dense refractory is mfd. by shaping compsn. and firing to 1400 deg.C. Pref. compsn. is 75099% ZrSiO4, 1-25 ZrO2 particles and opt. up to 2% grain growth aid. Refractory is used in glass melt furnace and contacted by glass or alkali vapour.
申请公布号 DE4042681(C2) 申请公布日期 2002.01.03
申请号 DE19904042681 申请日期 1990.08.30
申请人 CORHART REFRACTORIES CORP. 发明人 WEHRENBERG, THOMAS, MILTON;MCGARRY, CHARLES, NICHOLAS;MAHE, SYLVIE;DRAKE, DOUGLAS, A.
分类号 C03B5/43;C04B35/48;(IPC1-7):C04B35/482;C04B35/66 主分类号 C03B5/43
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