发明名称 Method for producing cerium-based polishing material and cerium-based polishing material produced by said method
摘要 This invention is a method for producing a cerium-based abrasive which includes: a step of grinding raw material for the cerium-based abrasive; a step of roasting the ground raw material; and a step of subjecting the roasted raw material to wet processing, the method being characterized in that it further includes a lower-temperature re-roasting step of heating the wet-processed raw material at 200 to 700° C. In the invention disclosed in this application, an abrasive with particularly preferable properties can be produced by fully drying the wet-processed raw material in a drying step, and subsequently subjecting the dried raw material to the lower-temperature re-roasting step.
申请公布号 US2004182954(A1) 申请公布日期 2004.09.23
申请号 US20040483890 申请日期 2004.01.15
申请人 ITO TERUNORI;UCHINO YOSHITSUGU;USHIYAMA KAZUYA;NAKASHIMA YUKI 发明人 ITO TERUNORI;UCHINO YOSHITSUGU;USHIYAMA KAZUYA;NAKASHIMA YUKI
分类号 C01F17/00;C04B35/50;C09K3/14;(IPC1-7):B02C19/12 主分类号 C01F17/00
代理机构 代理人
主权项
地址