发明名称 |
Method for producing cerium-based polishing material and cerium-based polishing material produced by said method |
摘要 |
This invention is a method for producing a cerium-based abrasive which includes: a step of grinding raw material for the cerium-based abrasive; a step of roasting the ground raw material; and a step of subjecting the roasted raw material to wet processing, the method being characterized in that it further includes a lower-temperature re-roasting step of heating the wet-processed raw material at 200 to 700° C. In the invention disclosed in this application, an abrasive with particularly preferable properties can be produced by fully drying the wet-processed raw material in a drying step, and subsequently subjecting the dried raw material to the lower-temperature re-roasting step. |
申请公布号 |
US2004182954(A1) |
申请公布日期 |
2004.09.23 |
申请号 |
US20040483890 |
申请日期 |
2004.01.15 |
申请人 |
ITO TERUNORI;UCHINO YOSHITSUGU;USHIYAMA KAZUYA;NAKASHIMA YUKI |
发明人 |
ITO TERUNORI;UCHINO YOSHITSUGU;USHIYAMA KAZUYA;NAKASHIMA YUKI |
分类号 |
C01F17/00;C04B35/50;C09K3/14;(IPC1-7):B02C19/12 |
主分类号 |
C01F17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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