发明名称 Methods and systems for preparing a sample for thin film analysis
摘要 Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.
申请公布号 US7190441(B1) 申请公布日期 2007.03.13
申请号 US20040021555 申请日期 2004.12.22
申请人 KLA-TENCOR TECHNOLOGIES CORP. 发明人 MCWHIRTER JAMES T.;WANG LIANG-GUO;KWAK HIDONG;ZOU HAIXING;GEORGESCO DAN;LAUTEE BERNARD;CHEN JENNMING JAMES;JANIK GARY R.;MAXTON PATRICK M.
分类号 G01N1/00 主分类号 G01N1/00
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