发明名称 |
Lithographic apparatus, reticle masking device for a lithographic apparatus, gas bearing and apparatus comprising such gas bearing |
摘要 |
A lithographic apparatus includes a guiding mechanism to guide a movable structure such as a mask blade of a reticle masking device, a movable part connected to the movable structure, and a substantially stationary part to guide the movable part. The movable part includes a nozzle to inject a gas in a gap between the movable and stationary parts, a contactless supply of the gas from the stationary part to the movable part being provided by a gas supply outlet in the stationary part and a gas supply inlet in the movable part. The gas supply outlet includes an inlet trench in a surface of the movable part facing the gas supply outlet of the stationary part, the trench being orientated parallel to a direction of movement of the movable part. The movable part includes a motor drive part and a counter weight part connected to an end of the motor drive part facing away from the movable structure.
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申请公布号 |
US7307689(B2) |
申请公布日期 |
2007.12.11 |
申请号 |
US20040024042 |
申请日期 |
2004.12.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DU MEE MAURICE PHILIPPE;BUIS EDWIN JOHAN;DAMS JOHANNES ADRIANUS ANTONIUS THEODORUS;JACOBS JOHANNES ANDREAS HENRICUS MARIA;VERWEIJ ANTOINE HENDRIK;REKKERS ERIK MARIA |
分类号 |
G03B27/42;G03B27/54;G03B27/62 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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