| 摘要 |
An evaporator with openings of different angles and an apparatus for vapor deposition of a thin film using the same are provided to prevent misalignment between a mask and a substrate due to simultaneous rotation of the substrate, the mask, and a substrate chucking system. An evaporator(10) with openings of different angles includes a crucible and a heating unit. The crucible has an opened upper surface and openings(400), and contains deposition material inside thereof. The heating unit heats the crucible. The openings have the different opening angles from each other. The openings get inclined to a center of the evaporator as they go from an edge to the center of the evaporator, and the opening at the center of the evaporator is formed at a right angle. A rotating unit rotates the evaporator by using external power. |
