| 发明名称 |
SINGLE-WAFER-TYPE CLEANING APPARATUS |
| 摘要 |
A single-wafer-type cleaning apparatus is provided. The single-wafer-type cleaning apparatus is configured to be capable of controlling electrostatic charges generated s due to rotating a wafer during a semiconductor cleaning process and a defect caused by the electrostatic charges. The cleaning process uses an ionizer mounted on a chuck. |
| 申请公布号 |
US2016197000(A1) |
申请公布日期 |
2016.07.07 |
| 申请号 |
US201514983530 |
申请日期 |
2015.12.29 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
KIM Namsuk;KWON Ohhyung;KIM Dae-Sung;LIM Jutaek;JUNG Jaehyung |
| 分类号 |
H01L21/687;B08B6/00;B08B3/10;H01L21/67;H01L21/02 |
主分类号 |
H01L21/687 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A single-wafer-type cleaning apparatus comprising:
a chamber; a chuck disposed in the chamber; an ionizer mounted on the chuck and configured to generate ions; at least one cleaning chemical dispensing nozzle disposed in the chamber; and a wafer fixing part disposed on the chuck. |
| 地址 |
Suwon-si KR |
