| 摘要 |
In an exposure apparatus exposes a substrate with an energy beam via a projection optical system, a substrate stage system has a movable body that holds the substrate and is driven to move the substrate. An encoder system measures positional information of the movable body by irradiating each of four areas of a grating section with a beam via each of four heads. A controller controls driving of the movable body based on the positional information measured by the encoder system. As the movable body moves, a relationship between the grating section and the heads changes between a first state, in which the four heads respectively face the four areas, and a second state, in which only three of the heads respectively face three areas of the four areas. At least three areas of the four areas are always faced by three of the heads at least during substrate exposure. |
| 主权项 |
1. A scanning exposure apparatus having an illumination optical system that illuminates a mask with illumination light and a projection optical system that projects a pattern image of the illuminated mask onto a substrate, the apparatus comprising:
a body having a frame member that supports the projection optical system; a mask stage system that has a first movable body and a first motor, the first movable body being placed above the projection optical system and holding the mask, and the first motor driving the first movable body; a first encoder system that has a plurality of first heads each irradiating a first measurement beam to a first grating section having a reflection type grating, and measures positional information of the first movable body moved by the first motor, the reflection type grating being placed substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system; a substrate stage system having a second movable body and a second motor, the second movable body being placed below the projection optical system and holding the substrate, and the second motor driving the second movable body; a second encoder system that has four second heads each irradiating a second measurement beam to a second grating section having four scales, and measures positional information of the second movable body moved by the second motor, the four scales each having a reflection type grating placed substantially parallel to the predetermined plane; and a controller coupled to the mask stage system and the substrate stage system, that controls a drive of the first movable body by the first motor based on measurement information of the first encoder system and also controls a drive of the second movable body by the second motor based on measurement information of the second encoder system so that the mask and the substrate are each moved relative to the illumination light in a scanning exposure of the substrate, wherein the plurality of first heads include two first heads that are different in position in a first direction which is orthogonal to the optical axis of the projection optical system and in which the mask is moved in the scanning exposure, and one first head that is different in position from the two first heads in a second direction orthogonal to the optical axis and orthogonal to the first direction, at least in an exposure operation of the substrate, a relationship between the second grating section and the four second heads changes between a first state and a second state by a movement of the second movable body, wherein
in the first state, the four second heads respectively face the four scales, andin the second state, only three of the four second heads respectively face three scales of the four scales, such that none of the four second heads faces a fourth one of the four scales, and at least during the scanning exposure, three scales of the four scales are always faced by three of the four second heads. |
