| 主权项 |
1. A resist protective film composition for lithography, the composition comprising:
a polymer having a weight average molecular weight of 2,000 to 100,000 comprising a repeating unit having a fluorine-containing functional group at a side chain of the polymer; and a solvent, wherein the solvent comprises a material which makes up 10 to 90 parts by weight based on 100 parts by weight of the total weight of the solvent; the material is at least one selected from 2,5-dimethyltetrahydrofuran, methyl hexanoate, 1,2-epoxypropane, 4-methyl-1,3-dioxane, 2-methoxy-1,3-dioxane, 2-ethyl-2-methyl-1,3-dioxane, dibutyl adipate, isoamyl acetate, cyclohexyl acetate, ethyl 3-oxohexanoate, 2,2,4,4-tetramethyl-3-pentanone, 2,4-dimethyl-3-pentanone, 4-heptanone, cyclopropyl methyl ketone, 3,3-dimethyl-2-butanone, and butyl acetate, and the polymer is at least one selected from Polymer 1; Polymer 2; Polymer 3; Polymer 4; Polymer 5; and Polymer 6:in the formula of Polymer 1, a is 100 parts by mole, and c is 10 to 900 parts by mole,in the formula of Polymer 2, a is 100 parts by mole, and b is 10 to 900 parts by mole,in the formula of Polymer 3, a is 100 parts by mole, b is 10 to 900 parts by mole, and c is 10 to 900 parts by mole,in the formula of Polymer 4, b1 is 100 parts by mole, and b2 is 10 to 900 parts by mole,in the formula of Polymer 5, a is 100 parts by mole, and b is 10 to 900 parts by mole, in the formula of Polymer 6, b1 is 100 parts by mole, and b2 is 10 to 900 parts by mole. |
