| 主权项 |
1. A pattern forming method, comprising:
(i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) in an amount of 20 mol % or more based on all repeating units in the resin (P), and a repeating unit, in addition to (a1), containing a group capable of decomposing by the action of an acid to produce a polar group; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern: wherein each of X1 and X2 independently represents a polymerization unit structure constituting a polymer main chain; Ra1 represents a (n+1)-valent alicyclic hydrocarbon group; Ra2 represents a (p×2+1)-valent alicyclic hydrocarbon group; each of L11, L12, L21 and L22 independently represents a single bond or a divalent linking group; each of Rb1 and Rb2 independently represents a hydrogen atom or a monovalent organic group; each of n and p independently represents an integer of 1 or more; m represents an integer of 0 to 2; o represents 0 or 1; Y1 represents a (m+1)-valent polar group selected from the group consisting of the following groups (a) to (c); and Y2 represents a (o+2)-valent polar group selected from the group consisting of the following groups (b) and (c):Group (a):
a group of monovalent organic groups consisting of a carboxyl group (—COOH), a cyano group (—CN), a nitro group (—NO2) and an aldehyde group (—CHO),Group (b):
a group of divalent polar groups consisting of a keto group (—CO—), a carbonate group (—O—CO—O—), a carboxylic acid anhydride group (—CO—O—CO—), a sulfinyl group (—SO—), a sulfonyl group (—SO2—) and a sulfonate group (—SO2—O—),Group (c):
a group of trivalent polar groups consisting of an amino group (—N<), an amido group (—CO—N<), a sulfonamido group (—SO2—N<), an imido group represented by the following formula:and a sulfonimide group represented by the following formula: provided that when Y1 is a keto group, Rb1 is not an alkoxy group, and when Y2 is a keto group, the divalent linking group L22 is not an oxygen atom; and wherein the resin composition further comprises a compound represented by formula (F): wherein each Ra independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, and when n=2, two Ra may be the same or different, and two Ra may combine with each other to form a divalent heterocyclic hydrocarbon group or a derivative thereof; each Rb independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group, provided that in —C(Rb)(Rb)(Rb), when one or more Rb are a hydrogen atom, at least one of remaining Rb is a cyclopropyl group or a 1-alkoxyalkyl group, and at least two Rb may combine to form an alicyclic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic hydrocarbon group or a derivative thereof; n represents an integer of 0 to 2, m represents an integer of 1 to 3, and n+m=3. |
