Method for manufacturing patterned layer and method for manufacturing electrochromic device

摘要

A method for manufacturing a patterned layer includes the steps of: providing a substrate having a first surface and a second surface opposite to the first surface; providing a material source for supplying a plurality of charged particles, in which the first surface faces the material source; providing a magnetic element, in which the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles on the first surface through using the magnetic element so as to form a patterned layer. A method for manufacturing an electrochromic device is disclosed as well.

主权项

1. A method for manufacturing a patterned layer, comprising:
providing a substrate into a sputtering chamber, the substrate having a first surface and a second surface opposite to the first surface; providing a material source in the sputtering chamber for supplying a plurality of charged particles, wherein the first surface of the substrate faces the material source; providing a magnetic element in the sputtering chamber, wherein the second surface is arranged between the magnetic element and the first surface; and depositing the charged particles via sputtering on the first surface by utilizing the magnetic element, and thereby forming a patterned layer.