SUBSTRATE TREATMENT DEVICE AND SLIT NOZZLE

摘要

PROBLEM TO BE SOLVED: To provide a substrate treatment device for achieving high discharge precision by smoothly discharging a treatment solution.

SOLUTION: A solution conveying mechanism 410 having elastic bodies 411a and 411b and a group of a plurality of piezoelectric element 412 is embedded in a channel 41a side face in the neighborhood of a slit 41b inside a slit nozzle 41. The respective piezoelectric elements 412 are vibrated and controlled so that progressive waves in the direction of the slit 41b (-Z direction) can be formed in the elastic bodies 411a and 411b, a resist solution is pumped by the progressive waves, and a treatment solution is discharged from the slit 41b to a substrate.

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