SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

A substrate processing apparatus includes a processing liquid nozzle that includes a nozzle pipe within which a processing liquid flow path is defined and a discharge port to which the processing liquid flow path is opened, a processing liquid holding unit that holds the processing liquid while maintaining the processing liquid at a predetermined high temperature higher than a room temperature, a processing liquid pipe that is connected to the processing liquid holding unit and the processing liquid nozzle and that guides the processing liquid held by the processing liquid holding unit to the processing liquid nozzle and an induction heating unit that heats, by induction heating, a heating target part which is provided in at least a part of a processing liquid distribution pipe including the processing liquid pipe and the nozzle pipe and which includes a magnetic inductive member material and/or a carbon material.

主权项

1. A substrate processing apparatus comprising:
a substrate holding unit that holds a substrate, a processing liquid nozzle that includes a nozzle pipe within which a processing liquid flow path for passing a processing liquid is defined and a discharge port to which the processing liquid flow path is opened, a processing liquid holding unit that holds the processing liquid while maintaining the processing liquid at a predetermined high temperature higher than a room temperature, a processing liquid pipe that is connected to the processing liquid holding unit and the processing liquid nozzle and that guides the processing liquid held by the processing liquid holding unit to the processing liquid nozzle, and an induction heating unit that heats, by induction heating, a heating target part which is provided in at least a part of a processing liquid distribution pipe including the processing liquid pipe and the nozzle pipe and which contains a magnetic inductive member material and/or a carbon material.