| 摘要 |
A manufacturing method for a COA-type liquid crystal panel and a COA-type liquid crystal panel. In the method, deviations resulting from overlaps between adjacent colour resistance blocks are eliminated by the forming of a planarization layer (55) on a colour resistance layer (54); a pixel electrode layer (8) is formed on the planarization layer (55), so that a transverse boundary of pixel electrode blocks of the pixel electrode layer (8) which are located in each sub-pixel region is located above a scanning line (35), and a longitudinal boundary is located above a signal line (7), and in this way, an array substrate (1) shields light leakage in a transverse direction depending on the scanning line (35) itself and shields light leakage in a longitudinal direction depending on the signal line (7) itself, without requiring the use of a black matrix to shield light leakage, thereby simplifying the manufacturing process and improving the aperture rate; and a gate electrode (5) and an amorphous silicon layer (21) are respectively arranged above and below a polycrystalline silicon layer (4) to shield light rays, so as to prevent light leakage from being produced at grooves and affecting a liquid crystal layer (3), and meanwhile light leakage caused by incorrect alignment of the array substrate (1) and a glass substrate (2) or by panel curve in curved display can be avoided. |
