| 摘要 |
PROBLEM TO BE SOLVED: To provide good anti-abrasive characteristics and reduce contamination stuck to a vacuum chuck, by preventing static electricity at a contacted position with a workpiece. SOLUTION: A position (of a vacuum chuck holder) contacted with a workpiece in a semiconductor wafer carrying and holding apparatus is made of ceramics composite, namely a silicon carbide substrate 6 that is coated with a film of the same kind of silicon carbide in a reduced pressure chemical evaporation method under non-oxidizing atmosphere. A composite material structure for the vacuum chuck holder includes a base substrate of α-type or β-type sintered silicon carbide, and the formed film is made of β-type crystallized silicon carbide. |
