发明名称 Process to produce silicon single crystal and heating apparatus for this process
摘要 <p>In the production of a silicon single crystal by pulling from a silicon melt in a quartz crucible, energy is supplied at least partially inductively by a spiral heater positioned below the crucible. Also claimed is a heater in the form of a wound spiral for heating a silicon-filled crucible, the spiral windings preferably being fixed on a bottom plate below the crucible by an electrically insulating material, preferably boron nitride.</p>
申请公布号 EP0854209(B1) 申请公布日期 2000.02.09
申请号 EP19970121840 申请日期 1997.12.11
申请人 WACKER SILTRONIC 发明人 VON AMMON, WILFRIED, DR.;TOMZIG, ERICH, DR.;FUCHS, PAUL;GELFGAT, YURI, PROF.
分类号 H05B6/18;C30B15/00;C30B15/14;C30B29/06;H05B6/02;H05B6/24;(IPC1-7):C30B15/14;C30B15/30 主分类号 H05B6/18
代理机构 代理人
主权项
地址
您可能感兴趣的专利