VENT DEVICE FOR VACUUM PRELIMINARY CHAMBER AND SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a vent method and a substrate processing device for a vacuum preliminary chamber capable of certainly preventing a pressure application of a vacuum preliminary chamber at the time of venting even if a relief valve is not used and a particle deposition to the substrate. SOLUTION: An exhaust center three-position directional control valve 48 for discharging air at both sides of a piston 36 of a double acting cylinder 34 at a center position is used at a cylinder control circuit 42a for controlling the double acting cylinder 34 for opening/closing a flap valve 4 partitioning the inside and the outside of the vacuum preliminary chamber. The three position directional control valve 48 is changed to a center position at approximately the same time of an opening of a vent valve to carry out an vent of the vacuum preliminary chamber. Thereby, the flap valve 4 has a function of a relief valve.