发明名称 |
Vacuum processing apparatus |
摘要 |
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
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申请公布号 |
US2006191118(A1) |
申请公布日期 |
2006.08.31 |
申请号 |
US20060346621 |
申请日期 |
2006.02.02 |
申请人 |
LEE YOUNG J;CHOI JUN Y;SON HYOUNG-KYU;LEE JEONG-BIN;KIM GYEONG-HOON;KIM HYUNG-SOO;HAN MYUNG-WOO |
发明人 |
LEE YOUNG J.;CHOI JUN Y.;SON HYOUNG-KYU;LEE JEONG-BIN;KIM GYEONG-HOON;KIM HYUNG-SOO;HAN MYUNG-WOO |
分类号 |
B23P19/04 |
主分类号 |
B23P19/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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