发明名称 Ferroelectric polymer memory structure and method therefor
摘要 A ferroelectric polymer memory device and its method of formation are disclosed. In accordance with one embodiment, lower electrode memory device portions are formed using a damascene patterning process and upper electrode memory device portions are formed using a subtractive patterning process.
申请公布号 US7344897(B2) 申请公布日期 2008.03.18
申请号 US20050124497 申请日期 2005.05.04
申请人 INTEL CORPORATION 发明人 DIANA DANIEL C.;DURAN CAROLYN R.;LINDSTEDT ROBERT C.;SILBERSTEIN MARIAN E.
分类号 H01L21/00 主分类号 H01L21/00
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