| 摘要 |
A substrate processing apparatus including a substrate support member is provided to prevent a process defective due to misalignment by aligning a substrate immediately before the substrate is loaded on a substrate support plate. A chamber(110) has a reaction space accommodating a substrate therein, in which a process is performed. A substrate support plate(112) is installed in the chamber to support the substrate during the process. The substrate support plate has a diameter smaller than the substrate. A substrate support member(130) is spaced apart from the substrate support plate, and has a flat portion(131) supporting the substrate, an inclined portion(132) formed along an edge of the flat portion, and a recessed portion formed at a position lower than the flat portion. The substrate support member is formed in a cylindrical shape enclosing the substrate support plate.
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