FILM-FORMING METHOD USING PLASMA IN LIQUID, AND FILM-FORMING APPARATUS USING PLASMA IN LIQUID

摘要

PROBLEM TO BE SOLVED: To provide a film-forming method using plasma in a liquid, which can form a film on the surface of a substrate by using not only a solid but also a liquid as raw materials. SOLUTION: With this film-forming method, decomposed components of a first raw material and a second raw material are deposited on the surface of the substrate 4 through an arrangement step of arranging a supply source 1 made from a solid including the second raw material and the substrate 4 so that both face to each other in a liquid L including the first raw material; a space-forming step of forming a vapor phase space G which continuously connects the supply source 1 with the substrate 4; the second raw material supply step of supplying the second raw material into the liquid L and/or the vapor phase space G by melting and/or vaporizing the supply source 1; and a plasma-generating step of generating plasma made from the first raw material or plasma made from the first raw material and the second raw material in the vapor phase space G. COPYRIGHT: (C)2009,JPO&INPIT