发明名称 NON-POLAR AND SEMI-POLAR GAN SUBSTRATES, DEVICES, AND METHODS FOR MAKING THEM
摘要 <p>Non-polar or semi-polar (Al, Ga, In)N substrates are fabricated by re-growth of (Al, Ga, In)N crystal on (Al, Ga, In)N seed crystals, wherein the size of the seed crystal expands or is increased in the lateral and vertical directions, resulting in larger sizes of non-polar and semi-polar substrates useful for optoelectronic and microelectronic devices. One or more non-polar or semi-polar substrates may be sliced from the re-grown crystal. The lateral growth rate may be greater than the vertical growth rate. The seed crystal may be a non-polar seed crystal. The seed crystal may have crystalline edges of equivalent crystallographic orientation.</p>
申请公布号 WO2009035648(A1) 申请公布日期 2009.03.19
申请号 WO2008US10638 申请日期 2008.09.12
申请人 KYMA TECHNOLOGIES, INC.;HANSER, ANDREW, D.;PREBLE, EDWARD, A.;LIU, LIANGHONG;CLITES, TERRY, L.;EVANS, KEITH, R. 发明人 HANSER, ANDREW, D.;PREBLE, EDWARD, A.;LIU, LIANGHONG;CLITES, TERRY, L.;EVANS, KEITH, R.
分类号 H01L33/16;H01L21/00;H01L33/00 主分类号 H01L33/16
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