发明名称 METHOD FOR SCREENING SHORT DEFECT BETWEEN BIT LINE AND BURIED CONTACT EFFICIENTLY IN SEMICONDUCTOR MEMORY DEVICE
摘要 PURPOSE: A method is provided to screen short defect between a bit line and a buried contact efficiently in a semiconductor memory device with a short screen time. CONSTITUTION: According to the method for screening short defect between a bit line and a buried contact in a semiconductor memory device, the above semiconductor memory device is activated one time at first. Then, a disturb operation is performed repetitively during a refresh time defined in the specification of the semiconductor memory device. And the semiconductor memory device is precharged one time.
申请公布号 KR20030087740(A) 申请公布日期 2003.11.15
申请号 KR20020025624 申请日期 2002.05.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HWANG, SAM JIN;JUN, CHAN UNG;KIM, IL SU;PARK, SANG JUN;YOON, JEONG GU
分类号 G11C29/00;(IPC1-7):G11C29/00 主分类号 G11C29/00
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