发明名称 |
METHOD FOR SCREENING SHORT DEFECT BETWEEN BIT LINE AND BURIED CONTACT EFFICIENTLY IN SEMICONDUCTOR MEMORY DEVICE |
摘要 |
PURPOSE: A method is provided to screen short defect between a bit line and a buried contact efficiently in a semiconductor memory device with a short screen time. CONSTITUTION: According to the method for screening short defect between a bit line and a buried contact in a semiconductor memory device, the above semiconductor memory device is activated one time at first. Then, a disturb operation is performed repetitively during a refresh time defined in the specification of the semiconductor memory device. And the semiconductor memory device is precharged one time.
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申请公布号 |
KR20030087740(A) |
申请公布日期 |
2003.11.15 |
申请号 |
KR20020025624 |
申请日期 |
2002.05.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG, SAM JIN;JUN, CHAN UNG;KIM, IL SU;PARK, SANG JUN;YOON, JEONG GU |
分类号 |
G11C29/00;(IPC1-7):G11C29/00 |
主分类号 |
G11C29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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