METHOD FOR FORMING PATTERN OF DEPOSIT METAL ON POLYMERIC SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a pattern of deposit metal on a polymeric substrate.SOLUTION: A method comprises the steps of: providing a polymeric film substrate having a major surface with a relief pattern having a recessed region and an adjacent raised region; depositing first material onto the major surface of the polymeric film substrate to form a coated polymeric film substrate; forming a layer of functional material selectively onto the raised region of the coated polymeric film substrate to form a functional raised region and an un-functional recessed region; and electrolessly depositing deposit metal selectively on the un-functionalized recessed region.SELECTED DRAWING: Figure 1H