Phase plate for a transmission electron microscope

摘要

The present invention relates to a method for cleaning a phase plate (1) for a transmission electron microscope wherein said phase plate is etched before being irradiated for the first time in the TEM, and is then held in an ultra-pure holding atmosphere until the irradiation in the TEM.

主权项

1. A method for cleaning a phase plate which is designed to be disposed and irradiated in an examination chamber in the beam path of a transmission electron microscope (TEM), comprising:
etching the phase plate with an etching agent that is suitable for removing a-compound that contains at least one of oxygen and carbon, said etching taking place before said phase plate is irradiated for the first time in said TEM, and after said etching, said phase plate being held for said irradiation in said TEM in a holding atmosphere in which the portion of at least one of compounds containing oxygen and compounds containing carbon is reduced, which for said compounds containing oxygen means a molecule concentration of at most 1·1011/cm3, and for said compounds containing carbon means a molecule concentration of at most 5·1013/cm3.