POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

The present invention relates to a positive resist composition comprising: (A) a base ingredient whose solubility to an alkaline developing solution is increased by the action of an acid; and (B) an acid generator which generates an acid by light exposure. The base ingredient (A) comprises a polymer compound (A1) having a structural unit (a0) represented by chemical formula (a0-1), a structural unit (a1) derived from an acrylate containing an acid-dissociatable dissolution-inhibiting group, and a structural unit (a3) represented by chemical formula (a3-1) and derived from an acrylate having a hydroxyl group-containing aliphatic hydrocarbon group, wherein the ratio of the structural unit (a3) based on the total structural units forming the polymer compound (A1) is 1-30 mol%.