发明名称 ULTRAVIOLET ACTIVATED ANTIMICROBIAL SURFACES
摘要 The invention is directed to an ion plasma deposition (IPD) method adapted to coat polymer surfaces with highly adherent antimicrobial films. A controlled ion plasma deposition (IPD) process is used to coat a metal or polymer with a selected metal/metal oxide. Exposing the coated surface to ultraviolet light significantly improves the antimicrobial properties of the deposited coatings.
申请公布号 US2016287760(A1) 申请公布日期 2016.10.06
申请号 US201615181651 申请日期 2016.06.14
申请人 METASCAPE, LLC 发明人 MCGRATH TERRENCE S.;SEWELL DEIDRE;STOREY DANIEL M.
分类号 A61L29/16;C23C14/30;A61L29/08;C23C14/34;A61L29/10;A61L29/04 主分类号 A61L29/16
代理机构 代理人
主权项 1. A medical device comprising: a substrate; and an antimicrobial coating material on the substrate, wherein the coating material is deposited onto the substrate in a gas-free environment while exposing the material to a light having ultra-violet wavelengths.
地址 MAPLE GROVE MN US