发明名称 PRODUCTION OF PHOTOMASK
摘要 PURPOSE:To obtain a hardly bent dry plate of high accuracy by sticking a light shielding film and a resist film on one side of a transparent substrate and forming a thin film on the other side. CONSTITUTION:A light shielding film 1b is stuck on one side of a transparent substrate 1a made of a quartz glass plate and a resist film 1c is formed on the film 1b. A thin film 2 for straightening the substrate 1a bent by the films 1b, 1c is formed on the other side of the substrate 1a. The resist film 1c of the resulting dry plate 1 is exposed, the thin film 2 is removed by etching with an etching soln. for the film 2 and the film 1c is developed. The light shielding film 1b is then etched to produce a photomask. Thus, the hardly bent photomask is easily obtd.
申请公布号 JPH01152458(A) 申请公布日期 1989.06.14
申请号 JP19870311661 申请日期 1987.12.08
申请人 FUJITSU LTD 发明人 OSHIMA TORU
分类号 G03F1/00;G03F1/50;G03F1/68;H01L21/027;H01L21/30 主分类号 G03F1/00
代理机构 代理人
主权项
地址