发明名称 |
VARIABLE STEP HEIGHT CONTROL OF LITHOGRAPHIC PATTERNING |
摘要 |
A method and apparatus for forming layers of photo-sensitive materials in different thicknesses. A mask (102) including a first area (102a) that substantially blocks light transmission and a second area (102d) having optical characteristics, which partially blocks light transmission is employed. Light (101) is projected through the mask (102) onto a layer of photo-sensitive material (107). The first area (102a) substantially blocks the light from passing through and leaves portions of the photo-sensitive material (107) unexposed. The secondary area (102d) reduces the intensity of light passing through the mask (102) and projected onto other portions of the photo-sensitive material (107). After developing the photo-sensitive material, at least two thicknesses of photo-sensitive material results. The second area (102d) may include a number of sections that vary from each other in optical characteristics such that the intensity of the light projected onto the layer of photo-sensitive material (107) through the second area (102d) varies in steps or continuously. |
申请公布号 |
WO9826331(A1) |
申请公布日期 |
1998.06.18 |
申请号 |
WO1997US23070 |
申请日期 |
1997.12.11 |
申请人 |
SYMBIOS, INC. |
发明人 |
MILLER, GAYLE, W.;LEE, BRIAN, R. |
分类号 |
G03F1/00;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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