发明名称 Apparatus and method for washing both surfaces of a substrate
摘要 An apparatus and method for scrubbing both surfaces of a substrate which includes a process section having a first unit, a second unit, a main arm mechanism for transferring a substrate into/from the first and second units, a first cassette or a second cassette section for transferring plural cassettes, a first and second sub-arm for transferring a substrate into/from the cassette sections, and controllers, such that a first substrate taken out from the first cassette section is subjected to the first unit and then subjected to the second unit, while a second substrate taken out from the second cassette is subjected to the second unit and then subjected to the first unit.
申请公布号 US5985039(A) 申请公布日期 1999.11.16
申请号 US19980028113 申请日期 1998.02.23
申请人 TOKYO ELECTRON LIMITED 发明人 YONEMIZU, AKIRA;MATSUYAMA, YUJI
分类号 H01L21/677;H01L21/00;H01L21/304;(IPC1-7):B08B3/00 主分类号 H01L21/677
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