| 摘要 |
<p>A method of treatment of the siliceous by-product coming from ferrosilicon production, wherein the siliceous by-product from ferrosilicon production is annealed to the temperature from 800 °C to 1200 °C, advantageously to 950 °C and subsequently is dissolved in the solution of sodium hydroxide so that the resulting volume rate SiO2 : Na2O is 2 : 1, advantageously 1 : 2, and subsequently is precipitated so that at first the specific amount of water is added to a reaction vessel and later, the solution of sodium silicate and acid are added simultaneously in order to maintain the pH value of the solution between 4.2 to 6.3, where the product captured by filtration is subsequently processed by heat, whereby it is dried and annealed to temperature 400 °C to 600 °C, advantageously 500 °C.</p> |
