发明名称 RELAY STATION AND SUBSTRATE PROCESSING SYSTEM USING RELAY STATION
摘要 <p>An inside of a relay station (10) is permitted to be a substrate storing section (10a), and on facing side walls of the substrate storing section, supporting sections (11) for supporting a plurality of semiconductor wafers are formed. On both sides of the relay station (10), a substrate processing apparatus side opening section (12) and a transferring apparatus side opening section (13) are formed, and these opening sections are provided with a substrate processing apparatus side opening/closing mechanism (14) and a transfer apparatus side opening/closing mechanism (15). A bottom plane (18) of the relay station (10) has a shape of a hoop conforming to the SEMI standards and can be placed on a placing table for placing the hoop. ® KIPO & WIPO 2007</p>
申请公布号 KR20070029172(A) 申请公布日期 2007.03.13
申请号 KR20067023911 申请日期 2006.11.15
申请人 TOKYO ELECTRON LIMITED 发明人 KARASAWA WATARU
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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