发明名称 |
Verfahren zur Herstellung von Kontaktöffnungen mit geringem Abstand in einem Flash-Speicher |
摘要 |
A method is provided for creating optical features on a lithography mask for use in patterning a series of openings of an etch mask on a semiconductor device wafer, comprising creating a series of optical features spaced on the lithography mask from one another along a first direction, where the individual optical features have first mask feature dimensions along the first direction that are smaller than a desired first dimension for the openings to be patterned in the etch mask. |
申请公布号 |
DE112005001926(T5) |
申请公布日期 |
2007.08.30 |
申请号 |
DE20051101926 |
申请日期 |
2005.04.29 |
申请人 |
ADVANCED MICRO DEVICES INC. |
发明人 |
LINGUNIS, EMMANUIL H.;CHENG, NING;RAMSBEY, MARK;GHANDEHARI, KOUROS |
分类号 |
H01L21/8247;G03F1/14;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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