Method for manufacturing photoresist having nanoparticles

摘要

An exemplary method for manufacturing photoresist includes the steps of: adding a metal salt into an aqueous solution, whereby the aqueous solution contains metallic ions ( 211 ); adding a sulfide containing sulfur ions ( 231 ) into the aqueous solution; adding a polymerizable surfactant ( 220 ) into the aqueous solution thereby forming metallic ion reverse micelles ( 210 ) and sulfur ion reverse micelles ( 230 ); reacting the metallic ion reverse micelles and the sulfur ion reverse micelles to create monomeric sulfureted metal nanoparticle reverse micelles ( 240 ); aggregating the monomeric sulfureted metal nanoparticle reverse micelles to polymeric macromolecular nanoparticles; and doping the polymeric macromolecules nanoparticles into a base material in order to obtain the photoresist having sulfureted metal nanoparticles. A diameter of the nanoparticles is in the range from 1x10^-9 meters to 1x10^-7 meters.