发明名称 |
Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
摘要 |
A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
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申请公布号 |
US7365103(B2) |
申请公布日期 |
2008.04.29 |
申请号 |
US20020318273 |
申请日期 |
2002.12.12 |
申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
WILLSON C. GRANT;STACEY NICHOLAS A. |
分类号 |
C08F220/18;B29C35/08;C08F2/48;C08F230/08;C08J3/28;G03F7/00;G03F7/004;G03F7/075 |
主分类号 |
C08F220/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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