发明名称 HIGH POWER EXCIMER LASER WITH A PULSE STRETCHER
摘要 An apparatus and method is disclosed which include a high power excimer or molecular fluorine gas discharge laser DUV light source system which includes a pulse stretcher which includes an optical delay path mirror, an optical delay path mirror gas purging assembly which includes a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror includes a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system includes a purging gas supply line; a purging gas distributing and directing mechanism which direct purging gas across the face of the respective optical delay path mirror.
申请公布号 WO2007143145(A3) 申请公布日期 2008.09.12
申请号 WO2007US13032 申请日期 2007.05.31
申请人 CYMER, INC.;ERSHOV, ALEXANDER, I.;FERRELL, JAMES, J.;HOFMANN, THOMAS;REILEY, DANIEL, J.;REMEN, CHRIS, R. 发明人 ERSHOV, ALEXANDER, I.;FERRELL, JAMES, J.;HOFMANN, THOMAS;REILEY, DANIEL, J.;REMEN, CHRIS, R.
分类号 H01S3/223 主分类号 H01S3/223
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