发明名称 SOURCE HOUSING ASSEMBLY FOR CONTROLLING ION BEAM EXTRACTION STABILITY AND ION BEAM CURRENT
摘要 Provided herein are approaches for improving ion beam extraction stability and ion beam current for an ion extraction system. In one approach, a source housing assembly may include a source housing surrounding an ion source including an arc chamber, the source housing having an extraction aperture plate mounted at a proximal end thereof. The source housing assembly further includes a vacuum liner disposed within an interior of the source housing to form a barrier around a set of vacuum pumping apertures. As configured, openings in the source housing assembly, other than an opening in the extraction aperture plate, are enclosed by the extraction aperture plate and the vacuum liner, thus ensuring appendix arcs or extraneous ions produced outside the arc chamber remain within the source housing. Just those ions produced within the arc chamber exit the source housing through the opening of the extraction aperture plate.
申请公布号 US2016336138(A1) 申请公布日期 2016.11.17
申请号 US201514713573 申请日期 2015.05.15
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Chang Shengwu;Burgess Jeff;Leavitt William;St Peter Michael;Mosher Matt;Olson Joe;Sinclair Frank
分类号 H01J27/08;H01J9/18;H01J9/385;H01J27/02 主分类号 H01J27/08
代理机构 代理人
主权项 1. A source housing assembly, comprising: a source housing including a distal end and a proximal end; an ion source including an arc chamber disposed within an interior of the source housing; and an extraction aperture plate mounted to the distal end of the source housing, the extraction aperture plate extending over an opening in the source housing defined by the interior of the source housing at the distal end, and the extraction aperture plate having an opening further defining an aperture of the arc chamber.
地址 Gloucester MA US