| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist compsn. excellent in sensitivity, the rate of a resid ual film, resolution, pattern shape and margin for exposure by incorporating a specified phenolic compd. SOLUTION: This resist compsn. contains alkali-soluble phenolic resin, a quinonediazidesulfonic ester sensitizer and a phenolic compd. represented by formula I, wherein each of X<1> -X<10> is H, halogen, hydroxyl, 1-8C straight chain, branched or cyclic alkyl, etc., or a group represented by formula II, at least one of X<1> -X<5> is hydroxyl and at least another is a group represented by the formula II, at least one of X<6> -X<10> is hydroxyl and at least another is a group represented by the formula II. In the formula II, each of X<11> -X<15> is H, halogen, hydroxyl, etc., and each of R<1> and R<2> is H or 1-3C optionally branched alkyl. |
