发明名称 Electroless nickel plating solution and method
摘要 To an electroless nickel plating solution comprising a water-soluble nickel salt, a reducing agent, and a complexing agent is added a polythionate or dithionite. The invention also provides a high-build electroless gold plating method comprising the steps of immersing a workpiece in the electroless nickel plating bath, thereby chemically depositing a nickel coating on the workpiece, and immersing the nickel-plated workpiece in an electroless gold plating bath, thereby chemically depositing a gold coating on the workpiece.
申请公布号 US5910340(A) 申请公布日期 1999.06.08
申请号 US19970931832 申请日期 1997.09.17
申请人 C. UYEMURA & CO., LTD. 发明人 UCHIDA, HIROKI;KISO, MASAYUKI;NAKAMURA, TAKAYUKI;KAMITAMARI, TOHRU;SUSUKI, RUMIKO;SHIMIZU, KOICHIRO
分类号 C23C18/34;C23C18/42;(IPC1-7):H01L21/302 主分类号 C23C18/34
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