| 摘要 |
PROBLEM TO BE SOLVED: To produce an ablation type image forming material having high resolving power, superior in film cleaner resistance and abrading resistance and less liable have pinholes. SOLUTION: One face of a transparent substrate is surface-modified by corona discharge treatment, an image-forming layer, containing a resin which has polar groups and a resin which has isocyanato groups is laminated on the modified face of the substrate and a protective layer is laminated on the image forming layer to obtain the objective ablation type image forming material. The corona discharge treatment is carried out at 5-30 W/m2/min intensity, dust is removed by at least one method selected from among suction, an adhesive roll and wiping and the image-forming layer and the protective layer are successively laminated by coating and drying. |
